发明名称 SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING THE SAME, OR DISPLAY DEVICE HAVING THE SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To suppress variation in electric characteristics and improve the reliability, in a transistor having an oxide semiconductor film.SOLUTION: Provided is a semiconductor device having a transistor. The transistor has: a first gate electrode; a first insulating film on the first gate electrode; a first oxide semiconductor film on the first insulating film; a source electrode electrically connected with the first oxide semiconductor film; a drain electrode electrically connected with the first oxide semiconductor film; a second insulating film on the first oxide semiconductor film; a second oxide semiconductor film that functions as a second gate electrode on the second insulating film; and a third insulating film on the second oxide semiconductor film. The second insulating film has an excess oxygen region, and the excess oxygen region has a concentration gradient.SELECTED DRAWING: Figure 1
申请公布号 JP2016178299(A) 申请公布日期 2016.10.06
申请号 JP20160053263 申请日期 2016.03.17
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 HIZUKA JUNICHI;OKAZAKI KENICHI;KAMINAGA MASAMI;KUROSAKI DAISUKE;IGUCHI TAKAHIRO;GOTO NAOHITO;YAMAZAKI SHUNPEI
分类号 H01L21/336;G02F1/1333;G02F1/1368;G09F9/30;H01L29/786;H01L51/50;H05B33/14 主分类号 H01L21/336
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