发明名称 Surface plasmon optic devices and radiating surface plasmon sources for photolithography
摘要 Disclosed is a surface plasmon optic device that has a periodic array of apertures in a dielectric substrate and a metal film formed on the dielectric substrate and emits light from metal-air interface. The surface plasmon optic device includes a surface plasmon generating apparatus, a surface plasmon detecting apparatus, a surface plasmon controlling apparatus, an etching apparatus, etc. if a metal diffraction grating is disposed on the metal film having a well-defined interface, propagation of the surface plasmon can be efficiently reflected, divided and controlled. Further, radiating surface plasmon having a half period of a lattice constant formed at air-metal ( 1, 0 ) can be preserved at a distance of at least a few micron.
申请公布号 US7359598(B2) 申请公布日期 2008.04.15
申请号 US20040494814 申请日期 2004.11.17
申请人 SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION 发明人 KIM DAI-SIK;HOHNG SUNG-CHUL;LIENAU CHRISTOPH;MALYARCHUCK VICTOR;PARK JONG-WAN;YOON YEO-CHAN;RYU HAN-YOUL;YOO KYEONG-HWA
分类号 G02B6/12;G02B6/26;G02B6/10;G02B6/42;G02F1/01;G03F7/20 主分类号 G02B6/12
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