发明名称 |
METHOD FOR FORMING CONDUCTIVE PATTERN BY DIRECT RADIATION OF ELECTROMAGNETIC WAVE, AND RESIN STRUCTURE HAVING CONDUCTIVE PATTERN THEREON (As Amended) |
摘要 |
Provided are a method for forming conductive pattern by direct radiation of an electromagnetic wave capable of forming fine conductive patterns on various kinds of polymer resin products or resin layers by a simplified process, even without containing specific inorganic additives in the polymer resin itself, and a resin structure having the conductive pattern formed thereon.;The method for forming the conductive pattern by direct radiation of the electromagnetic wave includes: forming a first region having a predetermined surface roughness by selectively radiating the electromagnetic wave on a polymer resin substrate; forming a conductive seed on the polymer resin substrate; forming a metal layer by plating the polymer resin substrate having the conductive seed formed thereon; and removing the conductive seed and the metal layer from a second region of the polymer resin substrate, wherein the second region has surface roughness smaller than that of the first region. |
申请公布号 |
US2016212860(A1) |
申请公布日期 |
2016.07.21 |
申请号 |
US201414910915 |
申请日期 |
2014.07.24 |
申请人 |
LG CHEM, LTD. |
发明人 |
KIM Jae Hyun;KIM Jae Jin;PARK Cheol-Hee;PARK Chee-Sung;JUN Shin Hee;JUNG Sang Yun;JEONG Han Nah |
分类号 |
H05K3/18;H05K1/09;H05K1/02;H05K3/02;C23C18/16;C23C18/31 |
主分类号 |
H05K3/18 |
代理机构 |
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代理人 |
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主权项 |
1. A method for forming conductive pattern by direct radiation of an electromagnetic wave, the method comprising:
forming a first region having a predetermined surface roughness by selectively radiating the electromagnetic wave on a polymer resin substrate; forming a conductive seed on the polymer resin substrate; forming a metal layer by plating the polymer resin substrate having the conductive seed formed thereon; and removing the conductive seed and the metal layer from a second region of the polymer resin substrate, wherein the second region has surface roughness smaller than that of the first region. |
地址 |
Yeongdeungpo-gu Seoul KR |