PLASMA CONTROLLING METHOD AND DEVICE IN SPUTTERING APPARATUS,申请号JP19920178801-传众专利搜索

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发明名称	PLASMA CONTROLLING METHOD AND DEVICE IN SPUTTERING APPARATUS
摘要
申请公布号	JPH05331638(A)	申请公布日期	1993.12.14
申请号	JP19920178801	申请日期	1992.05.28
申请人	UBE IND LTD	发明人	HARADA HIROSHI
分类号	C23C14/35;C23C14/54;(IPC1-7):C23C14/35	主分类号	C23C14/35
代理机构		代理人
主权项
地址

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