Gas apparatus, systems, and methods for chamber ports

摘要

An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.

主权项

1. A chamber port assembly of an electronic device manufacturing system, comprising:
a lid having a gas inlet formed therein and a first gas passageway extending there through, the first gas passageway in fluid communication with the gas inlet; a gas conduit member having a second gas passageway extending there through, the second gas passageway in fluid communication with the first gas passageway; a frame insert having a third gas passageway in fluid communication with the second gas passageway; and one or more gas nozzles coupled to the frame insert and in fluid communication with the third gas passageway, the one or more gas nozzles configured to direct a flow of gas received at the gas inlet into a substrate transfer area, the substrate transfer area configured to receive a substrate as the substrate is transferred through the chamber port assembly from a first chamber to a second chamber.