| 摘要 |
A glazing unit includes a glass substrate equipped on one of its faces, intended to form the face of the glazing unit in the use position, with a thin-film multilayer comprising, from the substrate, a film of a transparent electrically conductive oxide based on indium tin oxide of physical thickness e1 included in a range extending from 50 to 200 nm, a silicon-nitride barrier film of physical thickness e2, then a film based on silicon oxide, the thicknesses e1 and e2, expressed in nanometers, being such that 0.11≦̸e2/e1≦̸0.18. |
