Imaging device and method of manufacturing the same

摘要

In an imaging device having a waveguide, a surface of an insulating film covering a seal ring is prevented from getting rough. A pixel region, a peripheral circuit region, and a seal region are defined over a semiconductor substrate. After formation of a pad electrode in the peripheral circuit region and a seal ring in the seal ring region, a TEOS film is so formed as to cover the pad electrode and the seal ring. A pattern of a photoresist for exposing a portion of the TEOS film covering the pad electrode and the seal ring, respectively, is formed and etching treatment is subjected to the exposed TEOS film. Then, after the pattern of the photoresist has been formed, a second waveguide holding hole is formed in the pixel region by performing etching treatment.

主权项

1. An imaging device having a waveguide comprising:
a seal ring region including continuous ring-like seal rings formed over a semiconductor substrate; a pixel region including the waveguide, and a peripheral circuit region that are formed, respectively, in regions inside the seal ring region; and an insulating film so formed as to cover the pixel region, the peripheral circuit region, and the seal ring region, wherein a first concave portion is formed along the seal ring in a region located on the outward side of the seal ring in the insulating film, and wherein, when a position of a surface of the insulating film located right above the seal ring is referred to as a first position, a position of the surface of the insulating film located in the first concave portion is referred to as a second position, and a position of the surface of the insulating film located in a direction departing from the first concave portion for the outside of the seal ring region is referred to as a third position, the second position is lower than the first position in height, and the third position is lower than the first position but higher than the second position in height.