| 发明名称 |
METHOD AND APPARATUS FOR CAPACITANCE EXTRACTION |
| 摘要 |
A method comprises processing a layout of an integrated circuit to determine one or more attributes of one or more components of the integrated circuit. The method also comprises extracting one or more process parameters from a process file associated with manufacturing the integrated circuit. The one or more process parameters are extracted from the process file based on a computation of one or more logic functions included in the process file. The computation is based on the one or more attributes. The method further comprises calculating a capacitance value between at least two components of the integrated circuit based on the one or more process parameters and a capacitance determination rule included in the process file. At least one of the one or more process parameters, the one or more logic functions, or the capacitance determination rule is editable based on a user input. |
| 申请公布号 |
US2016232270(A1) |
申请公布日期 |
2016.08.11 |
| 申请号 |
US201514615084 |
申请日期 |
2015.02.05 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHOU Chih-Cheng;WU Tsung-Han;SU Ke-Ying;LEE Hsien-Hsin Sean;WANG Chung-Hsing |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method comprising:
processing a layout of an integrated circuit to determine one or more attributes of one or more components of the integrated circuit; extracting one or more process parameters from a process file associated with manufacturing the integrated circuit, wherein the one or more process parameters are extracted from the process file based on a computation of one or more logic functions, at least one of the one or more logic functions is included in the process file, and the computation is based on the one or more attributes; calculating a capacitance value between at least two components of the integrated circuit based on the one or more process parameters and a capacitance determination rule included in the process file; and generating a resistance capacitance technology file based on the extracted one or more process parameters, wherein at least one of the one or more process parameters, the one or more logic functions, or the capacitance determination rule is editable based on a user input, and at least one of the above steps is performed by a hardware computer. |
| 地址 |
Hsinchu TW |
