| 摘要 |
A resist coating film for etching having a pattern formed thereupon can be obtained at high speed and with high precision as a result of: coating, on to a steel band, a negative resist ink that hardens when exposed; drying same and forming a resist coating film; then irradiating light while moving, in synchronization with the travel speed of the steel band, a mask member that covers the resist coating film surface and blocks light; solidifying the resist coating film not covered by the mask member; and then removing the resist coating film other than the solidified section, by using a developing solution. In addition, a fine and uniform linear groove can be formed on the surface of the steel band, by dissolving and removing the portion of the steel band having the resist coating film removed by etching. |
