Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus.
摘要
An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table.
申请公布号
NL1035942(A1)
申请公布日期
2009.03.30
申请号
NL20081035942
申请日期
2008.09.16
申请人
ASML NETHERLANDS B.V.
发明人
EDWIN CORNELIS KADIJK;JEROEN VAN DEN AKKER;DAVID LUCIEN ANSTOTZ