| 摘要 |
A wavefront distortion amount measurement device according to the present invention is provided with: a wavefront modulator (14, 30, 130, 230) disposed at the pupil plane of a lens (21, 29, 229) or in a position conjugate to the pupil plane, an optical detector (23, 32, 132, 232) for detecting the intensity distribution of incident light having passed through the wavefront modulator and lens, a control means for controlling the phase modulation amount of the wavefront modulator, an interference component acquisition means for acquiring an interference component of light having passed through a prescribed area and light other than the light having passed through the prescribed area on the basis of the intensity distribution obtained by the optical detector when the phase modulation amount applied to the prescribed area by the wavefront modulator is changed, and a wavefront distortion amount calculation means for applying the Fourier transform to the interference component and calculating the phase component of the interference component having had the Fourier transform applied thereto as a wavefront distortion amount. The above configuration makes it possible to accurately and quickly measure and correct wavefront distortion. A wavefront distortion amount measurement device according to the present invention can be suitably applied to an optical correction device that corrects wavefront distortion or an optical measurement device that corrects wavefronts and carries out measurement. |
