发明名称 |
Molding press and a platen for a molding press |
摘要 |
Disclosed is a platen for a molding press for encapsulating semiconductor dies on a substrate, the platen comprising: a first mold chase having a first mold chase surface; the platen being operable to cooperate with a further platen having a second mold chase with a second mold chase surface to clamp a substrate, which is held against a substrate-facing surface relating to either the first or second mold chase surface, between the first and second mold chase surfaces to define at least one mold cavity with respect to the substrate; wherein the platen further comprises a rotational mounting device on which either the first or second mold chase is rotatable about at least one axis passing through the center of the substrate-facing surface to adjust the relative arrangement of the first and second mold chase surfaces. Also disclosed is a molding press comprising the platen, and the further platen cooperating with the platen. |
申请公布号 |
US9427893(B2) |
申请公布日期 |
2016.08.30 |
申请号 |
US201414489640 |
申请日期 |
2014.09.18 |
申请人 |
ASM TECHNOLOGY SINGAPORE PTE LTD |
发明人 |
Su Jian Xiong;Kuah Teng Hock;Ho Shu Chuen;Ding Jiapei;Raghavendra Ravindra |
分类号 |
B29C33/30;B29C43/36;H01L21/56;B29C43/32 |
主分类号 |
B29C33/30 |
代理机构 |
Ostrolenk Faber LLP |
代理人 |
Ostrolenk Faber LLP |
主权项 |
1. A molding press for encapsulating semiconductor dies on a substrate, the molding press comprising:
a first mold chase with a first mold chase surface; and a second mold chase with a second mold chase surface; the first and second mold chases being operable to clamp a substrate, which is held against a substrate-facing surface relating to either the first or second mold chase surface, between the first and second mold chase surfaces to define at least one mold cavity with respect to the substrate; wherein the molding press further comprises a rotational mounting device on which either the first or second mold chase is rotatable about an axis passing through a centre of the substrate-facing surface to adjust the relative arrangement of the first and second mold chase surfaces. |
地址 |
Singapore SG |