发明名称 Thermally enhanced structure for multi-chip device
摘要 A multi-chip semiconductor device comprises a thermally enhanced structure, a first semiconductor chip, a second semiconductor chip, an encapsulation layer formed on top of the first semiconductor chip and the second semiconductor chip. The multi-chip semiconductor device further comprises a plurality of thermal vias formed in the encapsulation layer. The thermally enhanced structure comprises a heat sink block attached to a first semiconductor die. The heat sink block may further comprise a variety of thermal vias and thermal openings. By employing the thermal enhanced structure, the thermal performance of the multi-chip semiconductor device can be improved.
申请公布号 US9530715(B2) 申请公布日期 2016.12.27
申请号 US201514851952 申请日期 2015.09.11
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Yu Chen-Hua;Tung Chih-Hang;Shao Tung-Liang
分类号 H01L23/34;H01L23/367;H01L23/31;H01L23/36;H01L21/48;H01L23/498;H01L23/00;H01L25/065;H01L23/373;H05K1/18;H01L23/532 主分类号 H01L23/34
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. An apparatus comprising: a first heat sink on a first side of a first semiconductor die, wherein the first heat sink comprises at least one thermal via and one thermal opening; the first semiconductor die having a second side coupled to an interposer through a plurality of bumps; and a substrate having a first side coupled to the interposer through a plurality of solder balls, wherein the first semiconductor die is placed between the interposer and the substrate and there is an air gap between a non-bonding surface of the first heat sink and the first side of the substrate.
地址 Hsin-Chu TW