| 发明名称 |
COMPOUND, ACID GENERATOR, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound suitable as an acid generator for a resist composition, an acid generator comprising the compound, a resist composition including the acid generator and a method of forming a resist pattern. <P>SOLUTION: The resist composition includes a base component (A) whose solubility in an alkali developer changes under the action of an acid and an acid-generator component (B) which generates an acid upon exposure to light, wherein the acid-generator component (B) includes an acid generator (B1) comprising a compound represented by general formula (b1-8). <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009151259(A) |
申请公布日期 |
2009.07.09 |
| 申请号 |
JP20080074467 |
申请日期 |
2008.03.21 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
IWAI TAKESHI;HANEDA HIDEO;ISHIZUKA KEITA;KAWAKAMI AKINARI;SESHIMO TAKEHIRO;TAKESHITA MASARU;MATSUZAWA KENSUKE |
| 分类号 |
G03F7/004;C07D333/76;C09K3/00;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
| 代理机构 |
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| 主权项 |
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