发明名称 |
METHOD OF SEASONING FILM-FORMING APPARATUS |
摘要 |
A method of seasoning a film-forming apparatus in which a silicon nitride film is formed on a base placed in a treatment vessel. The method is conducted for diminishing particles in the apparatus. The method comprises subjecting the treatment vessel to plasma cleaning to remove a film deposited on the inner wall thereof (step S1), subsequently depositing an amorphous silicon film (step S2), depositing thereon a silicon nitride film in which the nitrogen content gradually increases in the thickness direction (step S3), and keeping the inside of the treatment vessel being filled with a rare-gas plasma until film formation on the base is initiated (step S4).
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申请公布号 |
KR20080103068(A) |
申请公布日期 |
2008.11.26 |
申请号 |
KR20087022176 |
申请日期 |
2007.02.19 |
申请人 |
MITSUBISHI HEAVY INDUSTRIES, LTD. |
发明人 |
SHIMAZU TADASHI;KAWANO YUICHI |
分类号 |
C23C16/44 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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