发明名称 ELECTROLESS PLATINUM PLATING BATH
摘要 PROBLEM TO BE SOLVED: To provide an electroless platinum plating bath capable of suppressing film thickness fluctuation, plating at a lower temperature than hitherto, and depositing the whole platinum contained in the plating bath.SOLUTION: An electroless platinum plating bath contains tetraammine platinum(II) hydrogen citrate salt as a platinum source, a buffer agent such as citric acid, a stabilizer such as ammonia, a reducer such as sodium borohydride, and a pH regulator (pH 12-14) such as sodium hydroxide. In the electroless plating bath, tetraammine platinum(II) hydrogen citrate salt suppresses cluster formation, and the particle size in a dynamic light scattering method is 0.7 nm or less.SELECTED DRAWING: Figure 1
申请公布号 JP2016089203(A) 申请公布日期 2016.05.23
申请号 JP20140222914 申请日期 2014.10.31
申请人 ISHIFUKU METAL IND CO LTD 发明人 YOKOTA YUKIHISA;TAMURA NAOKO;TOMIOKA RYOSUKE;TAKAHASHI YUTA
分类号 C23C18/44;C01G55/00;H01L21/28;H01L21/288 主分类号 C23C18/44
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