Lithographic apparatus and device manufacturing method

摘要

A field manipulator to provide high resolution control of position in the XY plane and/or focus control. The field manipulator includes a plate located between the patterning device and the substrate. Control of the XY position is provided by tilting of the plate, while control of the focus position may be provided by localized deformation of the plate. Both adjustments may be performed by one or more actuators that act upon one or more edges of the plate. In an embodiment, two substantially parallel plates are provided and focus control can be provided by changing the spacing between them. A liquid may be provided between the plates which may be temperature controlled to adjust the focus by changing the refractive index of the liquid.

主权项

1. A lithographic apparatus comprising:
a support structure configured to support a patterning device used to pattern a radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system having an optical axis; and a field manipulator comprising a pair of substantially parallel plates and an actuator configured to act on at least one of the plates, the field manipulator located at or close to a field plane or a conjugate plane thereof; and a control system configured to cause the actuator to act on the at least one plate to adjust the position of the radiation beam in a plane orthogonal to the optical axis, and to cause the actuator to act on the at least one plate to adjust the focus of the radiation beam.