Semiconductor memory cell for holding data with small power consumption

摘要

A DRAM includes an N-type well formed on a main surface of a P-type semiconductor substrate, an N-type impurity region formed on the main surface of the P-type semiconductor substrate, a P-type impurity region formed in the N-type well to be a storage node of a memory capacitor, and a polycrystalline silicon layer for connecting the P-type impurity region and the N-type impurity region. The N-type impurity layer, the P-type impurity layer, and the polycrystalline silicon layer constitute the storage node of the memory capacitor, and electrons of minority carriers flowing from the substrate to the N-type impurity layer are recombined with holes flowing from the N-type well to the P-type impurity layer.