发明名称 Methods of forming spin on glass layers by curing remaining portions thereof
摘要 Methods of forming a spin-on-glass (SOG) layer are disclosed. An SOG layer is formed on an integrated circuit substrate. A first curing process is performed on the SOG layer. Less than all of the SOG layer is removed from the integrated circuit substrate through a mask pattern on the SOG layer to provide a remaining portion of the SOG layer on the integrated circuit substrate. A second curing process is performed on the SOG layer. The remaining portion of the SOG layer is removed to expose the integrated circuit substrate.
申请公布号 US2002111032(A1) 申请公布日期 2002.08.15
申请号 US20020060486 申请日期 2002.01.30
申请人 CHO MIN-HEE;CHO CHANG-HYUN;SHIN SOO-HO;JEONG HONG-SIK 发明人 CHO MIN-HEE;CHO CHANG-HYUN;SHIN SOO-HO;JEONG HONG-SIK
分类号 H01L21/768;H01L21/302;H01L21/308;H01L21/31;H01L21/311;H01L21/316;(IPC1-7):H01L21/302 主分类号 H01L21/768
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