| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce distortion of an image due to temperature gradient of a substrate and an immersion liquid in a liquid immersion projection exposure apparatus. <P>SOLUTION: In the liquid immersion lithographic apparatus including a temperature control unit for adjusting temperatures of a member in a final stage of the projection exposure apparatus PL, a substrate, and the immersion liquid to a common target temperature T4, the temperature gradient is reduced by adjusting total temperatures of these components. By doing so, matching properties of image formation and total performance are improved. Means to be used includes control of a flow rate and temperature of the immersion liquid by a feedback circuit. <P>COPYRIGHT: (C)2010,JPO&INPIT |
