| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure system and an exposure method with which a wafer where overlay deviation suddenly occurs can securely be detected without dropping throughput. <P>SOLUTION: An arrangement error measuring part 21 measures an arrangement error belonging to a specified layer that is already formed on a substrate. An element component calculator 22 decomposes the measured arrangement error into a plurality of element components. A fluctuation width calculator 23 calculates at least fluctuation width of one element component obtained for a plurality of substrates, preferably, the substrates between an orthogonal degree component and a scaling component. A comparator 3 compares calculated fluctuation width of the element component, and fluctuation permission width which is previously set for the element component and outputs comparison results. A decision part 4 decides presence of exposure processing abnormality based on the comparison results output from the comparator 3. Thus, a lot where sudden overlay deviation occurs can be detected in the exposure process. <P>COPYRIGHT: (C)2008,JPO&INPIT |
