| 摘要 |
The present invention is the invention of a polishing composition comprising a silica in which a functional group satisfying at least one of condition (1) and condition (2) described below is fixed on the surface, and a pH-adjusting agent; condition (1) : the functional group has an amino group; and condition (2) : the functional group has a halogeno group, and the polishing composition of the invention can sufficiently control a polishing rate of a Si-containing material. |
