发明名称 Exposure system and production method for exposure system
摘要 The invention is directed to the provision of an exposure apparatus in which is stored an electric current value appropriately determined for supply to a light-emitting device, and a method for producing such an exposure apparatus. The production method according to the invention comprises the steps of supplying a reference electric current to the light-emitting device, and measuring the amount of light from each of the plurality of pixels of the light modulating device, determining whether a minimum value among the amounts of light measured from the plurality of pixels lies within a predetermined range, and determining the value of the electric current to be supplied to the light-emitting device so that the minimum value of the amounts of light falls within the predetermined range when the minimum value of the amounts of light is outside the predetermined range.
申请公布号 US7616225(B2) 申请公布日期 2009.11.10
申请号 US20040498062 申请日期 2004.06.09
申请人 CITIZEN HOLDINGS CO., LTD. 发明人 SHIOTA AKIRA;YASUNAGA MAKOTO;MASUBUCHI SADAO;IWAKO AKINOBU
分类号 B41J2/435;B41J2/45;G06K15/12 主分类号 B41J2/435
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