发明名称 Spin coatable metallic hard mask compositions and processes thereof
摘要 The present invention relates to a novel spin coatable composition comprising (a) metallosilicic acid; (b) at least one compound comprising two or more 4-hydroxyphenyl groups; and, c) a solvent. The component b) can be a 4-hydroxyphenyl compound of structure (I) wherein W is a linking group chosen from the group consisting of an organic linking moiety, a heteroatom containing linking moiety and a direct valence bond, m is a positive integer of 1 and n is a positive integer equal to 1 or and Ri, Rii, Riii and Riv are independently chosen substituents from a group consisting of hydrogen, (C1-C6) alkyl, (C1-C6) alkoxy, (C6-C20) aryl, halides (such as Cl, I, F), hydroxyl, alkylcarbonyl (alkyl-C(═O)—), alkylcarbonyloxy (alkyl-C(═O)—O—), alkyloxycarbonyl (alkyl-O—C(═O)—), alkyloxycarbonyloxy (alkyl-O—C(═O)—O—) and mixtures of these; and a solvent.; The present invention further relates to processes using the novel compositions.
申请公布号 US9409793(B2) 申请公布日期 2016.08.09
申请号 US201414154929 申请日期 2014.01.14
申请人 AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. 发明人 Chada Venkata Gopal Reddy;Yao Huirong;Mullen Salem;Wolfer Elizabeth;Dioses Alberto D.;Cho JoonYeon;Padmanaban Munirathna
分类号 G03F7/004;C01G31/00;C01G39/00;C01G41/00;H01L21/033 主分类号 G03F7/004
代理机构 代理人 Brustein Mitchell
主权项 1. A composition which is an admixture comprising; (a) metallosilicic acid, wherein the amount of metallosilicic acid in the admixture ranges from about 55 wt % to about 95 wt % of total solids; b) at least one compound comprising two or more 4-hydroxyphenyl groups, wherein the attachment point of the phenyl moiety to other moieties is located para to the hydroxyl substituent and no substituents are located ortho to the hydroxyl substituent on the phenyl group; and, c) a solvent, wherein the compound comprising two or more 4-hydroxyphenyl groups is chosen from the group consisting of i), ii), iii), iv) and mixtures thereof, wherein, i) is a 4-hydroxyphenyl containing polymer comprising repeat unit of structure (II); wherein R1 is chosen from hydrogen or C1-C4 alkyl, and wherein the 4-hydroxyphenyl containing polymer further comprises repeat units chosen from the group consisting of structure (VI) and (VII) wherein R5 and R7 are independently chosen from C1-C4 alkyl and R6 and R8 are independently chosen from the group consisting of C1-C8 alkyl, C3-C12 branched alkyl, C3-C8 cycloalkyl, C6-C12 alicyclic alkyl, acid labile group and mixtures thereof ii) is a 4-hydroxyphenyl containing compound having structure (III), wherein X is chosen from a group selected from a direct valence bond, phenylene, C1-C8 linear or branched alkylene, C3-C8 cycloalkylene, sulfone, acetylene, oxygen, carbonyl and mixtures thereof; iii) is a 4-hydroxyphenyl containing compound having structure (IV), wherein R2 and R3 are independently chosen from the group consisting of hydrogen, C1-C8 alkyl, C3-C12 branched alkyl, C3-C8 cycloalkyl, C6-C12 alicyclic alkyl and mixtures thereof; and, iv) is a 4-hydroxyphenyl containing compound having structure (V), wherein R4 is chosen from the group consisting of hydrogen, C1-C8 alkyl, C3-C12 branched alkyl, C3-C8 cycloalkyl C6-C12 alicyclic alkyl, phenyl, 4-hydroxyphenyl and mixtures thereof.
地址 Luxembourg LU
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