发明名称 |
Method of producing solar cell |
摘要 |
A method for producing a thin-film solar cell includes successively depositing a lower anti-reflection film having a relatively large etching rate in a prescribed etchant and an upper anti-reflection film having a relatively small etching rate in the prescribed etchant on a photosensitive surface of a semiconductor substrate; patterning the upper anti-reflection film to form an aperture; and etching the lower anti-reflection film using the patterned upper anti-reflection film as a mask.
|
申请公布号 |
US5472885(A) |
申请公布日期 |
1995.12.05 |
申请号 |
US19940344600 |
申请日期 |
1994.11.18 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
MATSUNO, YOSHINORI;NAOMOTO, HIDEO;ARIMOTO, SATOSHI;MORIKAWA, HIROAKI;SASAKI, HAJIME |
分类号 |
H01L31/04;H01L31/0216;H01L31/0224;H01L31/0236;H01L31/0352;H01L31/068;H01L31/18;H01L33/00;(IPC1-7):H01L31/18 |
主分类号 |
H01L31/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|