| 发明名称 | Substrate structure | ||
| 摘要 | A substrate structure includes a substrate, a buffer layer, and a protecting layer. The substrate includes a side surface. The buffer layer is disposed between the side surface of the substrate and the protecting layer, and the hardness of the protecting layer is greater than the hardness of the buffer layer. | ||
| 申请公布号 | US9420681(B1) | 申请公布日期 | 2016.08.16 |
| 申请号 | US201514742721 | 申请日期 | 2015.06.18 |
| 申请人 | INTERFACE OPTOELECTRONICS (SHENZHEN) CO., LTD.;GENERAL INTERFACE SOLUTION LIMITED | 发明人 | Huang Shih-Chieh |
| 分类号 | H05K1/03;H05K1/02 | 主分类号 | H05K1/03 |
| 代理机构 | CKC & Partners Co., Ltd. | 代理人 | CKC & Partners Co., Ltd. |
| 主权项 | 1. A substrate structure, comprising: a substrate comprising a top surface, a bottom surface and a side surface disposed between the top surface and the bottom surface, and the substrate further comprising two strengthened layers on the top surface and the bottom surface of the substrate respectively; a buffer layer; and a protecting layer, wherein the buffer layer is disposed between the side surface and the protecting layer, and a hardness of the protecting layer is greater than a hardness of the buffer layer. | ||
| 地址 | Shenzhen CN | ||