| 摘要 |
The present invention provides an imprint apparatus which performs an imprint process of forming a pattern on a substrate by molding an imprint material on the substrate using a mold, the apparatus including a measurement unit configured to measure relative positions of the mold and the substrate, a light source unit configured to emit light for curing the imprint material, a scanning unit configured to scan light from the light source unit on the substrate, and a control unit configured to control the imprint process, wherein the control unit performs the imprint process by causing the scanning unit to scan the light while partially aligning the mold and the substrate with each other based on a measurement result of the measurement unit. |
