Pattern-independent and hybrid matching/tuning including light manipulation by projection optics

摘要

Described herein are methods for matching the characteristics of a lithographic projection apparatus to a reference lithographic projection apparatus, where the matching includes optimizing illumination source and projection optics characteristics. The projection optics can be used to shape wavefront in the lithographic projection apparatus. According to the embodiments herein, the methods can be accelerated by using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs).

主权项

1. A method comprising:
obtaining, by a computer system comprising hardware, model coefficients representing optical behavior of a lithographic process; obtaining, by the computer system, model coefficients representing optical behavior of a reference lithographic process separate from the lithographic process to which the lithographic process is to be tuned, wherein tuning comprises substantially matching the optical behavior of the lithographic process to the reference lithographic process, wherein the obtained model coefficients for the lithographic process and the reference lithographic process both comprise a non-diagonalized matrix of elements; and tuning, by the computer system, the lithographic process to the reference lithographic process by determining values of a plurality of design variables representing adjustable characteristics of the lithographic process that cause a termination condition corresponding to a difference between the obtained model coefficients for the lithographic process and the reference lithographic process to be reached, the lithographic process being configured for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics.