发明名称 Acoustic wave element and acoustic wave device using same
摘要 A SAW element has a substrate; an IDT electrode located on an upper surface of the substrate and comprises Al or an alloy containing Al; a first film located on an upper surface of the IDT electrode; and a protective layer which covers the IDT electrode provided with the first film and the portion of the substrate exposed from the IDT electrode, which has a thickness from the upper surface of the substrate larger than a total thickness of the IDT electrode and first film, and which contains a silicon oxide. The first film contains a material which has a larger acoustic impedance than the material (Al or the alloy containing Al) of the IDT electrode and the silicon oxide and which has a slower propagation velocity of an acoustic wave than the material of the IDT electrode and the silicon oxide.
申请公布号 US9503049(B2) 申请公布日期 2016.11.22
申请号 US201113878116 申请日期 2011.12.22
申请人 KYOCERA CORPORATION 发明人 Nishii Junya;Kishino Tetsuya;Tanaka Hiroyuki;Kobayashi Kyohei;Yamamoto Kenji;Shimozono Masahisa;Ikuta Takanori;Nishimura Michiaki
分类号 H03H9/25;H03H9/145;H03H9/64 主分类号 H03H9/25
代理机构 Procopio Cory Hargreaves and Savitch LLP 代理人 Procopio Cory Hargreaves and Savitch LLP
主权项 1. An acoustic wave element, comprising: a piezoelectric substrate; an electrode which is located on an upper surface of the piezoelectric substrate and which contains Al as a major component; a first film which is located on an upper surface of the electrode; and an insulation layer which covers the first film and a portion of the piezoelectric substrate which is exposed from the electrode, which has a thickness from the upper surface of the piezoelectric substrate which is larger than a total thickness of the electrode and the first film, and which contains a silicon oxide as a major component, wherein the first film contains as a major component a material which has a larger acoustic impedance than a material of the electrode and a material of the insulation layer and which has a slower propagation velocity of an acoustic wave than the material of the electrode and the material of the insulation layer, and wherein a normalized thickness t/λ of the first film is within a range of a following equation (A): t0/λ≦t/λ≦T/λ−0.1   equation (A) where T/λ is a normalized thickness of the insulation layer, “t” is a thickness of the first film, T is a thickness of the insulation layer, λ is a wavelength of the acoustic wave, and t0 is a thickness of the first film where a frequency of an upper end of a stop-band coincides with an antiresonance frequency.
地址 Kyoto-shi, Kyoto JP