Photoresist stripping composition for manufacturing LCD

摘要

The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.

主权项

1. A photoresist stripping composition for manufacturing LCD, the composition comprising:
(a) 1 to 20% by weight of a tertiary alkanolamine compound of the formula (I); (b) 10 to 40% by weight of water; (c) 20 to 98% by weight of an organic solvent which forms a saturated or unsaturated hydrocarbon chain, of a 4 to 6 membered ring, which has one more oxygen atoms and which is substituted with a substituent of a hydroxyl (C1-C5) alkyl; and (d) 5 to 80% by weight based on the composition of a polar solvent which is selected from the group consisting of N-methylpyrollidone, Sulfolane, Dimethylsulfoxide, Dimethylacetamide, MMF (Monoethylformamide), and their mixtures, wherein, R is a linear or branch chained C1-C6 alkylene, and X is OH or H.