Method of etching a semiconductor layer of a photovoltaic device

摘要

A method and apparatus provide for a roughened back surface of a semiconductor absorber layer of a photovoltaic device to improve adhesion. The roughened back surface may be achieved through an etching process.

主权项

1. A method of manufacturing a photovoltaic device, the method comprising:
forming an absorber layer having a back surface; etching at least a portion of the back surface of the absorber layer with an etchant comprising HCl and H2O2 to increase roughness of the back surface of the absorber layer; treating the etched absorber layer with a chloride compound, said treating comprising CdCl2 doping the absorber layer and heating the absorber layer; and forming a conductive material in contact with the back surface of the absorber layer; and wherein said etching increases a roughness mean value from below about 10 nm prior to etching to greater than about 10 nm after etching.