| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device capable of shortening the distance between an antenna and a processed substrate while keeping the mechanical strength of the antenna.SOLUTION: A plasma processing device 10 comprises a mounting table 14, and an antenna 22a. The mounting table 14 is provided in a processing container, and mounts a substrate W thereon. The antenna 22a is provided above the mounting table 14 so as to face the mounting table 14, includes a top plate 40, and generates plasma of the process gas supplied into the processing container by irradiating a microwave into the processing container via the top plate 40. The top plate 40 is provided on a lower surface of the antenna 22a, and includes a flat plate part 40a in which at least a surface on the side facing the mounting table 14 is formed in a planar form, and a rib 40b protruding upward from the flat plate part 40a along a peripheral edge of the flat plate part 40a.SELECTED DRAWING: Figure 5 |
