发明名称 A METHOD OF SPUTTER DEPOSITION OF A FILM ON AN ESSENTIALLY PLANE EXTENDED SURFACE OF A SUBSTRATE
摘要 A film is sputter-deposited on an essentially plane, extended surface of a substrate which has recesses therein, namely at least one of grooves, of holes, of bores, of vias, of trenches. So as to establish on one hand a homogeneous thickness distribution of the film along the addressed surface of the substrate and, on the other hand, a thick film deposition within the recesses, sputter deposition is performed first at a large distance between a sputter surface of a target and the addressed surface of the substrate and then at a reduced distance between the addressed surfaces.
申请公布号 EP3108029(A1) 申请公布日期 2016.12.28
申请号 EP20150706717 申请日期 2015.02.13
申请人 Evatec Advanced Technologies AG 发明人 RATTUNDE, Oliver;HIRSCHER, Hans
分类号 C23C14/34;C23C14/04;H01J37/34 主分类号 C23C14/34
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