| 摘要 |
Device for the inspection of moving semiconductor wafers (1), comprising a light source (4) for at least wafer supported by a transfer element (2), said source being designed to emit two incident beams (5) onto a surface (1a) of the wafer (1), said incident beams being inclined to the normal to said surface (1a), and a detection module (6) for detecting interference fringes in the beam (7) reflected by the surface (1a) of the wafer (1).
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