发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a silicon coupling agent showing high bonding properties with a base material in resin molding at &ge;200&deg;C, a resin composition containing the silicon coupling agent and having excellent stability, and to provide a resin molding method for integrating the resin composition and the base material together. <P>SOLUTION: A photosensitive resin composition comprises (i) one or more resins selected from the group consisting of a polyimide precursor resin, a polybenzoxazole precursor resin, a polyamide resin, and a phenol resin, (ii) a silicon coupling agent represented by general formula (1) and obtained by reacting an isocyanate compound or a carbonate derivative with a silicon compound having an amino group or reacting a silicon compound having an isocyanate group with monoamine and/or monovalent alcohol, and (iii) a sensitizer. In the formula, R<SB>1</SB>, R<SB>2</SB>are each independently a 1C-4C alkyl group; R<SB>3</SB>is a divalent organic group; R<SB>4</SB>is a group selected from-NH-R<SB>5</SB>or -O-R<SB>6</SB>, (each of R<SB>5</SB>and R<SB>6</SB>is a monovalent organic group not including a COOH group); and n is an integer of 1-3. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010090386(A) 申请公布日期 2010.04.22
申请号 JP20090275205 申请日期 2009.12.03
申请人 ASAHI KASEI E-MATERIALS CORP 发明人 TAKAHASHI HIDEAKI;KANEDA TAKAYUKI
分类号 C08L79/04;C08K5/544;C08L61/06;C08L77/00;C09D7/12;C09D161/04;C09D177/00;C09D179/04;C09D179/08;G03F7/023;G03F7/027;G03F7/038;G03F7/075;H01L21/027 主分类号 C08L79/04
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