发明名称 HEAT TREATMENT DEVICE AND HEAT TREATMENT METHOD
摘要 According to the present invention, a thin plate member in an unheated state is introduced into an upstream-side chamber having a low oxygen atmosphere with an oxygen concentration of 0.01% or less. Thereafter, inside a treatment chamber having a low oxygen atmosphere with a constant oxygen concentration of 0.01% or less, the thin plate member is loaded onto a heating plate heated to a predetermined heating temperature and the thin plate member is heated. Inside the treatment chamber, the thin plate member is loaded onto a cooling plate cooled to a predetermined cooling temperature and the thin plate member is cooled. Next, the thin plate member is left in the atmosphere.
申请公布号 WO2016190320(A1) 申请公布日期 2016.12.01
申请号 WO2016JP65344 申请日期 2016.05.24
申请人 NTN CORPORATION 发明人 HIRAYAMA Eri;IWAKAWA Masahiro;SUZUKI Shintaro
分类号 C21D9/40;C21D1/18;C21D1/74;F16C19/30;F16C33/64 主分类号 C21D9/40
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