发明名称 WAFER LEVEL INTERCONNECTION
摘要 RF MicroElectroMechanical Systems (MEMs) circuitry (15) on a first high resistivity substrate (17) is combined with circuitry (11) on second low-resistivity substrate (13) by overlapping the first high resistivity substrate (17) and MEMs circuitry (15) with the low resistivity substrate (13) and circuitry (11) with the MEMs circuitry (15) facing the second circuitry (11). A dielectric lid (19) is placed over the MEMs circuitry (15) and between the first substrate (17) and second substrate (13) with an inert gas in a gap (21) over the MEMs circuitry (15). Interconnecting conductors (25, 31, 35, 37, 39, 41) extend perpendicular and through the high resistivity substrate (17) and through the dielectric lid (19) to make electrical connection with the low resistivity substrate (13).
申请公布号 WO02055431(A2) 申请公布日期 2002.07.18
申请号 WO2001US50411 申请日期 2001.12.20
申请人 RAYTHEON COMPANY 发明人 CHEEVER, JAMES, A.;GOLDSMITH, CHARLES, L.;EHMKE, JOHN, C.;ABLES, BILLY, D.
分类号 B81B7/02;B81B7/00;H01H59/00;H01L23/04;H01L25/065;H05K1/03;H05K1/14 主分类号 B81B7/02
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