发明名称 Method and system for manufacturing a reticle using character projection lithography
摘要 A method for manufacturing a surface, the surface having a multiplicity of slightly different patterns, is disclosed with the method comprising the steps of designing a stencil mask having a set of characters for forming the patterns on the surface and reducing shot count or total write time by use of a character varying technique. A system for manufacturing a surface is also disclosed.
申请公布号 US7745078(B2) 申请公布日期 2010.06.29
申请号 US20080269777 申请日期 2008.11.12
申请人 D2S, INC. 发明人 FUJIMURA AKIRA;GLASSER LANCE;MITSUHASHI TAKASHI;HAGIWARA KAZUYUKI
分类号 G03C5/00;G03F9/00 主分类号 G03C5/00
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