| 摘要 |
Provided is a plasma processing technology which makes it possible to generate plasma of a large area with excellent repeatability, is applicable to various purposes and uses a low-cost plasma source. Specifically, a plasma source mechanism (1) is applicable to a vacuum apparatus (21) having a vacuum chamber (20), and the plasma source mechanism is provided with an antenna section (12), which is disposed outside a vacuum tank (20) through a dielectric section (10) and permits high frequency power to be applied; and a magnet section (11) which is disposed in the vicinity of the antenna section (12) outside the vacuum chamber (20) through the dielectric section (10) and has a rectangular shape that corresponds to the antenna section (12). In the antenna section (12), first and second antenna coils (14, 15) are adjacently disposed, and the first and the second antenna coils (14, 15) are connected in parallel to each other.
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