发明名称 POWER SEMICONDUCTOR DEVICE
摘要 A drift region has a first conductivity type. A well region is at least partially included in an interface area, has an end portion between the interface area and an edge termination area, and has a second conductivity type. An extension region extends outward from the well region, is shallower than the well region, and has the second conductivity type. A plurality of field-limiting rings are provided outside the extension region in the edge termination area. Each of the field-limiting rings together with the drift region located on the inner side forms a unit structure. The field-limiting ring located closer to the outside has a lower proportion of a width to a width of the unit structure. The unit structure located closer to the outside has a lower average dose.
申请公布号 US2016260703(A1) 申请公布日期 2016.09.08
申请号 US201415030714 申请日期 2014.01.29
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 NAKAMURA Katsumi
分类号 H01L27/02;H01L29/40;H01L29/06;H01L29/739;H01L29/10 主分类号 H01L27/02
代理机构 代理人
主权项 1. A power semiconductor device having an active area, an interface area provided around a periphery of said active area, and an edge termination area provided around a periphery of said interface area, said power semiconductor device comprising: a semiconductor substrate having a first surface and a second surface opposite to said first surface, said first surface and said second surface each being located across said active area, said interface area, and said edge termination area, said semiconductor substrate including a drift region that is provided across said active area, said interface area, and said edge termination area and has a first conductivity type,a well region that is provided on said first surface, is at least partially included in said interface area, has an end portion on said first surface between said interface area and said edge termination area, and has a second conductivity type different from said first conductivity type,an extension region that extends outward from said well region on said first surface, is shallower than said well region, and has said second conductivity type, anda plurality of field-limiting rings that are provided on said first surface outside said extension region in said edge termination area and have said second conductivity type, said drift region being located on the inner side of each of said field-limiting rings on said first surface, each of said field-limiting rings together with said drift region located on the inner side forming at least one unit structure, said field-limiting ring located closer to the outside having a lower proportion of a width to a width of said unit structure on said first surface, said unit structure located closer to the outside having a lower average dose; a first electrode that is provided in said active area and contacts said first surface of said semiconductor substrate; and a second electrode contacting said second surface of said semiconductor substrate.
地址 Tokyo JP