POLISHING PAD AND METHOD OF MANUFACTURING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a polishing pad with which polishing speed is high due to excellent wettability of a polishing pad surface with slurry and an edge of an object to be polished is hard to be excessively polished.

SOLUTION: The polishing pad is equipped with a polishing layer on a base material layer. The polishing layer is made of thermosetting polyurethane foam including a continuum of approximately spherical air bubbles. The thermosetting polyurethane foam is a reactive hardened body of a urethane composition containing an isocyanate component and an active-hydrogen-containing compound. The active-hydrogen-containing compound contains carboxyl-group-containing polymeric polyol. A content of the carboxyl group with respect to a total weight of the active-hydrogen-containing compound ranges from 0.3 to 3 wt.%.

COPYRIGHT: (C)2010,JPO&INPIT