CHEMICAL VAPOR DEPOSITION STARTING MATERIAL COMPRISING HETEROGENEOUS POLYNUCLEAR COMPLEX, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID CHEMICAL VAPOR DEPOSITION STARTING MATERIAL

摘要

The present invention relates to a chemical vapor deposition starting material represented below that comprises a heterogeneous polynuclear complex in which at least a diimine and carbonyl are coordinated, as ligands, to a first transition metal and second transition metal which are central metals. The first transition metal (M1) and second transition metal (M2) are different from each other. There are 1-2 diimines (L), inclusive, to which substituent groups R1-R4 which are each either hydrogen atoms or C1-5 alkyl groups are coordinated. The chemical vapor deposition starting material of the present invention makes it possible, using a single starting material, to form a composite metal thin film or composite metal compound thin film including a plurality of metals.