发明名称 |
METHOD FOR MANUFACTURING COMPOUND MATERIAL WAFERS AND METHOD FOR RECYCLING A USED DONOR SUBSTRATE |
摘要 |
A method for manufacturing a compound material wafer and a method for recycling a used donor substrate are provided to improve a recycling rate of the used donor substrate and to economize fabrication costs by removing precipitates and nuclei in the process using one-time heat treatment. An insulating layer(5) is formed on the initial donor substrate(1). An isolation region(7) is formed in an initial donor substrate. The initial donor substrate is attached to a handle substrate(9). A predetermined layer of the initial donor substrate is transferred to the handle substrate to form a compound wafer. One-time heat treatment is performed on the initial donor substrate to reduce partially oxygen precipitates and nuclei in residues(13) of the initial donor substrate.
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申请公布号 |
KR20070093798(A) |
申请公布日期 |
2007.09.19 |
申请号 |
KR20070000569 |
申请日期 |
2007.01.03 |
申请人 |
S.O.I. TEC SILICON ON INSULATOR TECHNOLOGIES (S.A.) |
发明人 |
REYNAUD PATRICK;NEYRET ERIC;DELPRAT DANIEL;KONONCHUK OLEG;STINCO MICHAEL |
分类号 |
H01L27/12 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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