发明名称 METHOD FOR MANUFACTURING COMPOUND MATERIAL WAFERS AND METHOD FOR RECYCLING A USED DONOR SUBSTRATE
摘要 A method for manufacturing a compound material wafer and a method for recycling a used donor substrate are provided to improve a recycling rate of the used donor substrate and to economize fabrication costs by removing precipitates and nuclei in the process using one-time heat treatment. An insulating layer(5) is formed on the initial donor substrate(1). An isolation region(7) is formed in an initial donor substrate. The initial donor substrate is attached to a handle substrate(9). A predetermined layer of the initial donor substrate is transferred to the handle substrate to form a compound wafer. One-time heat treatment is performed on the initial donor substrate to reduce partially oxygen precipitates and nuclei in residues(13) of the initial donor substrate.
申请公布号 KR20070093798(A) 申请公布日期 2007.09.19
申请号 KR20070000569 申请日期 2007.01.03
申请人 S.O.I. TEC SILICON ON INSULATOR TECHNOLOGIES (S.A.) 发明人 REYNAUD PATRICK;NEYRET ERIC;DELPRAT DANIEL;KONONCHUK OLEG;STINCO MICHAEL
分类号 H01L27/12 主分类号 H01L27/12
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