RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern can be produced with good line edge roughness (LER).SOLUTION: The resist composition comprises: a resin having a structural unit represented by formula (I) and a structural unit having an acid-labile group; and an acid generator represented by formula (B1). In the formulae, Rrepresents a hydrogen atom or a methyl group; Rrepresents a hydrocarbon group; Arepresents a divalent hydrocarbon group or the like; Qand Qrepresent a fluorine atom or a perfluoroalkyl group; Lrepresents a divalent saturated hydrocarbon in which -CH- included in the group may be replaced by -O- or -CO- and a hydrogen atom in the group may be replaced by a fluorine atom or a hydroxy group; Y represents an alkyl group or an alicyclic hydrocarbon group optionally having a substituent, in which -CH- included in the group may be replaced by -O- or the like; and Zrepresents an organic cation.SELECTED DRAWING: None