发明名称 |
Method and Apparatus for Coating Nanoparticulate Films on Complex Substrates |
摘要 |
Active films and processes for depositing the same onto a complex 3D shape substrates and implants are provided. The process comprises the following steps: inserting into a process chamber a sputtering target, including at least two chemical elements and a complex shape 3D substrate on a substrate holder, providing a gas to be ionized into the process chamber with a controlled pressure; applying a voltage in pulse between the sputtering target and the complex shape 3D substrate; and generating a magnetic field at the surface of the sputtering target inside the process chamber as required for HIPIMS. |
申请公布号 |
US2016376694(A1) |
申请公布日期 |
2016.12.29 |
申请号 |
US201315039457 |
申请日期 |
2013.11.27 |
申请人 |
ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) |
发明人 |
Kiwi Juan;Rtimi Sami;Pulgarin César |
分类号 |
C23C14/06;C23C14/35;C23C14/54;H01J37/34;A01N59/16;A61L29/10;A61L31/16;A61L31/08;A01N59/20;C23C14/34;A61L29/16 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
Lausanne CH |