发明名称 LOAD LOCK CHAMBER PURGE SYSTEM OF NEGATIVE PRESSURE PROCESSING EQUIPMENT AND ITS METHOD
摘要 PROBLEM TO BE SOLVED: To provide a system and a method for improving the environment reacting with the reactive gas following a sample or a reaction product at the time of processing and the moisture in the atmosphere by covering the interior or the periphery of a load lock chamber with inert gas (e.g. dry N2) atmosphere thereby suppressing the intrusion of the outer air into that part. SOLUTION: When a sample is carried into a load lock chamber under negative pressure or carried out therefrom through an atmosphere side opening, gas is introduced from a gas inlet provided in the chamber. Subsequently, an atmosphere side gate valve is opened and while sustaining introduction of gas from the gas inlet and supplying gas from the gas inlet of a cover, atmosphere in the cover is discharged from an exhaust opening provided in the cover and the sample is carried in or out. The atmosphere is prevented from flowing into the chamber by controlling the introduction of gas and the volume of exhaust gas when the gate valve is opened. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005050852(A) 申请公布日期 2005.02.24
申请号 JP20030202914 申请日期 2003.07.29
申请人 HITACHI KASADO ENG CO LTD 发明人 KURIHARA KIYOSHI;KUDO KATSUYOSHI;MATSUMOTO TOKUYUKI
分类号 C23C16/44;H01L21/31;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 C23C16/44
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