VACUUM CLEANING DEVICE AND VACUUM CLEANING METHOD

摘要

Provided is a vacuum cleaning device capable of cleaning by CO2 particles in a low dew point atmosphere. An embodiment of the present invention is a vacuum cleaning device (10) provided with: a vacuum chamber (27); a holding mechanism disposed within the vacuum chamber for holding a substrate (12); a nozzle (11) for spraying CO2 particles on the substrate held by the holding mechanism; a CO2 supply mechanism for supplying pressurized CO2 to the nozzle; and an evacuation mechanism for evacuating the vacuum chamber.