| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic device with a chuck constructed to hold a substrate table, to provide a stage device on which an object is arranged, and to provide a method of manufacturing a device. <P>SOLUTION: Disclosed is the lithography device which includes: an illumination system constructed to adjust a radiation beam; a supporter constructed to support a patterning device capable of generating a pattern imparted emitted beam by giving a pattern on a cross section of an emitted beam; a substrate table constructed to hold a substrate; a projection system constructed to project the pattern imparted radiation beam to a target part of the substrate; a chuck constructed to hold the substrate table; a positioning device for displacing the chuck in use; and a control unit constructed to control the positioning device. The control unit drives the positioning device to excite the chuck by substantially dynamical force that enables deformation of the chuck before positioning the patterning device. <P>COPYRIGHT: (C)2009,JPO&INPIT |
