| 发明名称 |
CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION FOR THICK FILM |
| 摘要 |
A chemically amplified positive-type photosensitive resin composition for a thick film including an acid generator which is capable of producing an acid when irradiated with an active beam or radiation and includes a compound having a carboxyl group; a resin whose solubility in alkali increases under the action of an acid and which includes an acrylic resin containing a structural unit derived from acrylic ester having a cyclic group containing —SO2— or a cyclic group containing lactone; and an organic solvent. |
| 申请公布号 |
US2016231651(A1) |
申请公布日期 |
2016.08.11 |
| 申请号 |
US201615006473 |
申请日期 |
2016.01.26 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
Yamamoto Yuta;Kuroiwa Yasushi |
| 分类号 |
G03F7/038;G03F7/20;G03F7/32;G03F7/16 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A chemically amplified positive-type photosensitive resin composition for a thick film used for forming a thick film resist pattern having a film thickness of 10 μm or more, comprising:
an acid generator which is capable of producing an acid when irradiated with an active beam or radiation and includes a compound having a carboxyl group; a resin whose solubility in alkali increases under the action of an acid and which includes an acrylic resin containing a structural unit derived from acrylic ester having a cyclic group containing —SO2— or a cyclic group containing a lactone; and an organic solvent. |
| 地址 |
Kawasaki-shi JP |
