| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a gray tone mask blank and a gray tone mask, particularly a gray tone mask using a light-semitransmitting film, with which a desired pattern can be obtained on a transfer object upon forming a precise pattern. <P>SOLUTION: This invention relates to the gray tone mask blank to be used for manufacturing a gray tone mask for forming a desired transfer pattern including segments with different residual film values on a transfer object body by selectively decreasing the dose of exposure light to the transfer object depending on the exposure region, wherein the gray tone mask blank includes a light-semitransmitting film and a light-shielding film on a transparent substrate, with the light-semitransmitting film showing≤4.0% dispersion (change rate) of the transmittance for the exposure light in a region where at least the mask pattern is formed within the substrate plane. By subjecting the mask blank to predetermined patterning, a light-shielding part, a light-transmitting part and a light-semitransmitting part are formed to obtain a gray tone mask. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
